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FFT Inc al2o3 thin film
Al2o3 Thin Film, supplied by FFT Inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/al2o3+thin+film/al2o3+thin+film/us11390525-164-1-31
Average 90 stars, based on 1 article reviews
al2o3 thin film - by Bioz Stars, 2026-09
90/100 stars

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Article Title: Carbon nanotube aggregate comprising a non-aligned portion
Article Snippet: An Al2O3 thin film (ultimate vacuum: 8.0×10−4 Pa, sputtering gas: Ar, gas pressure: 0.50 Pa) was formed in an amount of 3,922 ng/cm2 on a silicon base material (manufactured by Valqua FFT Inc., thickness: 700 μm) with a sputtering apparatus (manufactured by Shibaura Mechatronics Corporation, product name: “CFS-4ES”).

Article Title: Mounting member
Article Snippet: An Al2O3 thin film (ultimate vacuum: 8.0×10 4 Pa, sputtering gas:Ar, gas pressure: 0.50 Pa, growth rate: 0.12 nm/sec, thickness: 20 nm) was formed on a silicon substrate (manufactured by Valqua FFT Inc., thickness: 700 μm) with a sputtering apparatus (manufactured by Shibaura Mechatronics Corporation, product name: “CFS-4ES”).



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